Basic Information |
|
| Product Name： | CHROMIUM |
| CAS： | 7789-02-8 ;7440-47-3 |
| English Synonyms： | CHROMIUM IN XYLENE ; CHROMIUM AA SINGLE ELEMENT STANDARD ; CHROMIUM(III) NITRATE NONAHYDRATE, 99% ; YEAST BOUND CHROMIUM ; CHROMIUM SOLUTION ; ELECTROLYTIC CHROMIUM ; CHROMIUM ICP STANDARD ; QUILON(R) L CHROMIUM COMPLEX ; CHROMIUM, ANALYTICAL STANDARD ; CHROMIUM PLASMA STANDARD ; CHROMIUM SINGLE ELEMENT STANDARD ; CHROMIUM IN HYDROCARBON OIL ; CHROMIUM III SPECIATION SINGLE ; CHROMIUM VI SPECIATION SINGLE ; CHROMIUM SINGLE ELEMENT PLASMA STANDARD ; CHROMIUM ; CHROMIUM, OIL BASED STANDARD ; CHROMIUM STANDARD ; CHROMIUM AA STANDARD ; CHROMIUM ATOMIC ABSORPTION STANDARD ; CHROME ; CHROMIUM METAL ; AQUANAL(TM)-PLUS CHROMIUM |
| MDL Number.： | MFCD00010944 |
| H bond acceptor： | 0 |
| H bond donor： | 0 |
| Smile： | [Cr] |
| InChi： | InChI=1S/Cr |
| InChiKey： | InChIKey=VYZAMTAEIAYCRO-UHFFFAOYSA-N |
Property |
|
| Melting Point： | 1857 DEG C(LIT)/1890℃ |
| Boiling Point： | 2672 DEG C(LIT)/2480℃ |
| Density： | 7.14g/mLat25°C(lit.) |
| Physical Property： | RESISTIVITY: 12.7 MUOMEGA-CM 20 DEG C |
| Comments： | APPLICATION: SPUTTERING IS A PROCESS WHEREBY ATOMS ARE EJECTED FROM A SOLID TARGET MATERIAL DUE TO BOMBARDMENT OF THE TARGET BY ENERGETIC PARTICLES. IT IS COMMONLY USED FOR THIN-FILM DEPOSITION, ETCHING AND ANALYTICAL TECHNIQUES ASSAY METHOD: TRACE METALS BASIS DIAM X THICKNESS: 3.00 IN X 0.125 IN WGK: 3 |
Safety information |
|
| Symbol： |
GHS09
|
| Signal word： | Warning |
| Hazard statements： | H400 |
| Precautionary statements： | P273 |
| Safe Code： | S:S24/25 |
| WGK Germany： | 3 |
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