Basic Information |
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| Product Name： | SAND |
| CAS： | 7631-86-9 ;60676-86-0 ;14464-46-1 ;14808-60-7 |
| English Synonyms： | SILICA ; SILICON (IV) OXIDE ELECTRONIC GRADE (99.999%-SI) ; WHITE QUARTZ ; SILICON (IV) OXIDE, 99.9% (METALS BASIS) -325 MESH ; SILICA NANOSPRINGS COATED WITH ZINC OXIDE AND GROWN ON FIBER GLASS SUBSTRATE (3.5 X 8CM) ; SAND ; SILICA SAND ; CRISTOBALITE ; QUARTZ SAND ; SILICA NANOSPRINGS GROWN ON GLASS SLIDE SUBSTRATE (2.5 X 7.5CM) ; SAND, OTTAWA ; SILICON DIOXIDE SPUTTERING TARGET 99.99% (METALS BASIS) ; QUARTZ ; SILICON (IV) OXIDE, 99.995% (METALS BASIS) -40 MESH POWDER ; SILICA NANOSPRINGS COATED WITH TITANIUM DIOXIDE AND GROWN ON FIBER GLASS SUBSTRATE (3.5 X 8CM) ; SILICON (IV) OXIDE, 99.99% (METALS BASIS) 3-12MM FUSED LUMP FOR VACCUM DEPOSITION ; SILICON DIOXIDE ; SILICON (IV) OXIDE, 99.5% -500 MESH POWDER ; SILICON DIOXIDE 99+% FOR ANALYTICAL PURPOSE ; FLINT ; SILICA NANOSPRINGS GROWN ON ALUMINUM FOIL SUBSTRATE (3.5 X 8CM) ; SILICON (IV) OXIDE, 99.5% -300 MESH POWDER ; SILICON (IV) OXIDE, 99.9% (METALS BASIS) -325 MESH ; SILICON (IV) OXIDE, 99.99% (METALS BASIS) 1-3MM FUSED LUMP FOR VACCUM DEPOSITION ; SILICA NANOSPRINGS COATED WITH TITANIUM DIOXIDE AND GROWN ON GLASS SLIDE SUBSTRATE (2.5 X 7.5CM) ; SILICON DIOXIDE SPUTTERING TARGET 99.995% (METALS BASIS) ; SILICON (IV) OXIDE 99.99% (METALS BASIS) 3-5MM FUSED LUMP FOR VACCUM DEPOSITION |
| MDL Number.： | MFCD02100519 |
| H bond acceptor： | 0 |
| H bond donor： | 0 |
| InChi： | InChI=1S// |
| InChiKey： | InChIKey=MOSFIJXAXDLOML-UHFFFAOYSA-N |
Property |
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| Melting Point： | 1710 DEG C |
| Boiling Point： | 2230 DEG C |
| Specification： | REAGENT GRADE |
Safety information |
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