CCD:CCD00063337
CAS:201058-08-4;65307-53-1
MDL:MFCD00131778
Synonyms:HMP RESIN VHL;4-HOCH2-PH-O-CH2-PH-POLYMER;4-ALKOXYBENZYL ALCOHOL RESIN;WANG RESIN LL;WANG'S RESIN;P-BENZYLOXYBENZYL ALCOHOL RESIN;4-苯甲氧基苄醇树脂;WANG ALCOHOL RESIN;4-HYDROMETHYLPHENOXYACETIC ACID AM RESIN;HMP RESIN;4-BENZYLOXYBENZYL ALCOHOL ON POLYSTYRENE;4-HYDROXYMETHYLPHENOXYACETYL-4'-METHYLBENZYHYDRYLAMINE RESIN;P-ALKOXYBENZYL ALCOHOL, POLYMER-BOUND;NOVASYN(R) TG HMP RESIN;P-METHOXYBENZYL ALCOHOL RESIN;[4-(HYDROXYMETHYL)PHENOXYMETHYL]POLYSTYRENE;WANG RESIN;聚苄氧基苄醇;POLYSTYRENE PHB;NOVASYN TG HMP RESIN;4-BAP;4-BENZYLOXYBENZYL ALCOHOL RESIN;树脂;WANG CHEMMATRIX(R) RESIN;4-BENZYLOXYBENZYL ALCOHOL, POLYMER-BOUND;4-HYDROXYMETHYL-PHENOXY CHEMMATRIX RESIN;WANG RESIN VHL;STRATOSPHERES(TM) PL-WANG RESIN;4-(羟甲基)苯氧甲基聚苯乙烯树脂交联1%DVB(200-400mesh)(1.0-2.0mmol/g);WANG PS RESIN;BENZYLOXYBENZYL ALCOHOL ON POLYSTYRENE;P-ALKOXYBENZYL ALCOHOL RESIN;4-BENZYLOXYBENZYL ALCOHOL, POLYMER SUPPORTED;4-(HYDROXYMETHYL)PHENOXYMETHYL POLYSTYRENE RESIN;P-BENZYLOXYBENZYL ALCOHOL RESIN VHL;王氏树脂;4-BENZYLOXYBENZYL ALCOHOL POLYSTYRENE
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